This course will cover basic surface chemistry relating with semiconductor/nanomaterials processing. It consists of three main parts: basic surface chemistry, surface analysis techniques (principle), examples of surface analysis study.
본 강의는 반도체 공정 및 나노재료/프로세스와 관련된 surface physical chemistry를 중점적으로 다룬다. 반도체/나노 공정과 관련된 화학공정 시 일어나는 표면현상 및 이의 분석을 위한 초 진공 표면과학기술 전반을 다룬다. 또한 이와 관련된 technical research paper들을 다룸으로써 표면과학기술의 응용에 대한 이해를 높이고자 한다. 본 강의의 목표는 반도체/나노공정 및 표면과학에 관심이 있는 학생들이 그와 관련된 연구를 하는데 있어서 도움을 주고자 한다.

N/A

Midterm test 35 %
Final/term project 35 %
Homework 20 %
Attendance 10 %

D. P. Woodruff and T. A. Delchar, "Modern techniques of surface science",
Cambridge University Press (1994)
Richard I. Masel, "Principles of adsorption and reaction on solid surfaces",
John Wiley & Sons (1996)
-K. Christmann, “Introduction to Surface Physical Chemistry”, Darmstadt :
Steinkopff : New Tork : Springer (1991)
-Stephen A. Campbell, "The science and engineering of microelectronic
fabrication", Oxford University Press (1996)
-Keith J. Laidler, "Chemical Kinetics", HarperCollins Publishers (1987)
-Gabor A. Somorjai, “Introduction to Surface Chemistry and Catalysis”, John Wiley &
Sons, Inc. (1994)

Lecture 1: Introduction: Role of Surface Chemistry in Semiconductor/Nano-Processing
Lecture 2: Surface Structure and Reconstruction
Lecture 3: Adsorption
Lecture 4: Desorption Kinetics/Analysis of Desorption
Lecture 5: Surface Reaction
Lecture 6: Surface Diffusion/Crystal Growth
Lecture 7: Vacuum Technology
Lecture 8: Overview: Surface Science Techniques
Lecture 9: Electron Spectroscopy I
Lecture10: Electron Spectroscopy II
Lecture11: Surface structure and Electron Diffraction
Lecture12: Surface structure and Scanning Probe Microscopy (SPM)
Lecture13: Ion-Surface Interaction I
Lecture14: Ion-Surface Interaction II
Lecture15: Surface Chemistry in Metal-organic Chemical Vapor Deposition (MOCVD)/
Atomic Layer Deposition (ALD)
Lecture16: Surface Chemistry in Nanotechnology